PHOTORESISTS & SPECIALTY CHEMICALS
Permanent Photo-patternable Epoxies
Permanent Photo-patternable Polymers
Temporary Lift-off Resists
Semiconductor Technologies
Other
Positive Photoresists
Negative Photoresists
E-beam Resists
Nanoimprint Lithography Resists
Hybria Polymers
MICROPOSIT™ LOL™ 1000 & LOL 2000 Liftoff Layers
Enhanced dissolution rate, dyed PMGI solution used for lift-off processes requiring tight CD control
· Sub-micron lift-off capability
· Compatible with g-, h-, and i-Line and 193 nm photoresists
· Excellent adhesion to thin film head and semiconductor substrates
Ancillaries:
· Dupont Developers
· Remover 1165
Applications:
· Bi-layer Lift-off
MODEL
LOL 1000
LOL 2000
上海甫晟微半导体有限公司
上海 奉贤 平庄西路1599号，201400
Tel: 021- 4001274753
Fax: 13776005180(Wechat)
E-mail: 13776005180@163.com
www.fushengwei.com
For more information, please visit our website:
https://www.fushengwei.com
The copyright belongs to our company and cannot be copied, copied or used in any other way without permission. Otherwise, our company will have the right to pursue legal responsibility.
© 2023 上海甫晟微半导体有限公司 版权所有 沪ICP备2023014501号-1 技术支持：迅响科技