PHOTORESISTS & SPECIALTY CHEMICALS
Permanent Photo-patternable Epoxies
Permanent Photo-patternable Polymers
Temporary Lift-off Resists
Semiconductor Technologies
Other
Positive Photoresists
Negative Photoresists
E-beam Resists
Nanoimprint Lithography Resists
Hybria Polymers
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上海甫晟微半导体有限公司
上海 奉贤 平庄西路1599号，201400
Tel: 021- 4001274753
Fax: 13776005180(Wechat)
E-mail: 13776005180@163.com
www.fushengwei.com
For more information, please visit our website:
https://www.fushengwei.com
The copyright belongs to our company and cannot be copied, copied or used in any other way without permission. Otherwise, our company will have the right to pursue legal responsibility.
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