SU-8 Negative Epoxy Resists
Kayaku Advanced Materials, Inc. epoxy resists consist of chemically amplified, epoxy-based negative resists that are highly functional, and photo-imageable to near UV (365nm) radiation. Cured films or microstructures are very resistant to solvents, acids and bases and have excellent thermal and mechanical stability, making them well suited for fabricating permanent structures such as pixel walls, fluidic channels and nozzles, micro arrays and spacers.
Epoxy Resists | Features | UV Sensitivity | Film Thickness (optimum) | Resolution |
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· Wide range of viscosities · High aspect ratio patterning · Photo-definable ultra-thick structures |
i-line | 10-200 µm | >10:1 Aspect Ratio |
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· Improved substrate wetting · Faster drying · Higher process throughput |
i-line | 10-100 µm | >10:1 Aspect Ratio |
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· Improved substrate adhesion · Reduced coating stress |
i-line | 10-70 µm | >5:1 Aspect Ratio |
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· High resolution thin film processing · Highly uniform thin films · Improved substrate adhesion |
g-, h-, i-line | 0.5-100 µm | High resolution |