SU-8
SU-8 is a high contrast, epoxy-based photoresist designed for micromachining and other microelectronic applications where a thick chemically and thermally stable image is desired. The exposed and subsequently cross-linked portions of the film are rendered insoluble to liquid developers. SU-8 has very high optical transparency above 360 nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films. SU-8 is best suited for permanent applications where it is imaged, cured and left in place.
Material attributes:
· High aspect ratio imaging with near vertical sidewalls
· Near UV (350-400 nm) processing
· Film thicknesses from 2 to 200 μm with single spin coat processes
· Superb chemical and temperature resistance
Material uses:
· MEMS devices
· PDMS molding
· Inkjet nozzles
· Microfluidics
MEMS gears with SU-8 removed
Honeycomb structure in thick SU-8 resist.
MODEL
SU-8 2
SU-8 5
SU-8 10
SU-8 25
SU-8 50
SU-8 100
