MEGAPOSIT™ SPR™660 Series Advanced i-Line Photoresists
Designed for processing 0.350 micron features and larger
· Performs in both line/space and contact hold applications
· Performs on a variety of substrates including silicon, silicon dioxide,
titanium nitride, and organic anti-reflectant coatings
· Family includes range of undyed dilutions and two dye loadings
· High throughput
Ancillaries:
· Remover PG
· Remover 1112A
· CD-26 Developer
· Remover 1165
· EBR-10A Edge Bead Remover
Applications:
· High Resolution i-Line
· Bi-layer Lift-off
MODEL
SPR660-0.8
SPR660-1.0
SPR660-1.2
SPR660-1.5
SPR660-2.1
SPR660-3.0
SPR660M-0.6
SPR660M-1.5
SPR660L-1.0
