MEGAPOSIT™ SPR™955-CM Series High Resolution i-Line Photoresists
General purpose, high-throughput, i-Line photoresist for 0.35 µm front-end and back-end applications
· Dense lines/spaces and isolated lines on polysilicon, and in high-aspect ratio films on TiN
· Contact holes on oxide
· Fast photo speed
Ancillaries:
· Remover PG
· Remover 1112A
· CD-26 Developer
· MF-26A Developer
· Remover 1165
· EBR-10A Edge Bead Remover
Applications:
· High Resolution i-Line
· Bi-layer Lift-off
MODEL
SPR 955CM-0.7
SPR 955CM-0.9
SPR 955CM-1.1
SPR 955CM-1.4
SPR 955CM-1.8
SPR 955CM-2.1
