MEGAPOSIT™ SPR™3000 Series Photoresists
Positive photoresist engineered for i-Line, g-Line, and broadband applications with high resolution, high throughput, and excellent process latitudes
· Glycol ether- and xylene-free solvent system
· Excellent adhesion
· Superior coating uniformity
Ancillaries:
· Remover PG
· Remover 1112A
· MF-26A Developer
· M-351 Developer
· Remover 1165
· EBR-10A Edge Bead Remover
Applications:
· Wet Etch
· Dry Etch