MICROPOSIT™ S1800® G2 Series Photoresists
Positive photoresists for advanced IC device fabrication
· Cellosolve™ acetate and xylene-free
· Excellent adhesion and coating uniformity
· Optimized for g-Line exposure
Ancillaries:
· MCC Developers
· Remover PG
· Remover 1112A
· CD-26 Developer
· MF-26A Developer
· MF-319 Developer
· M-351 Developer
· Remover 1165
· Remover 1165
Applications:
· Wet Etch
· Bi-layer Lift-off
MODEL
S1805 G2
S1811 G2
S1813 G2
S1818 G2
