PHOTORESISTS & SPECIALTY CHEMICALS
Permanent Photo-patternable Epoxies
Permanent Photo-patternable Polymers
Temporary Lift-off Resists
Semiconductor Technologies
Other
Positive Photoresists
Negative Photoresists
E-beam Resists
Nanoimprint Lithography Resists
Hybria Polymers
UV™ 135 Positive DUV Photoresist
An advanced resist for 130 nm design rules:
· Low iso-dense bias
· Maximum isolated film retention to <110 nm
· Compatible with PSM & OPC assist features to enlarge process windows
Ancillaries:
· AR 3 BARC
· CD-26 Developer
· MF-26 Developer
· Remover 1165
Applications:
· 130 nm device node
MODEL
UV135
上海甫晟微半导体有限公司
上海 奉贤 平庄西路1599号，201400
Tel: 021- 4001274753
Fax: 13776005180(Wechat)
E-mail: 13776005180@163.com
www.fushengwei.com
For more information, please visit our website:
https://www.fushengwei.com
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