PHOTORESISTS & SPECIALTY CHEMICALS
Permanent Photo-patternable Epoxies
Permanent Photo-patternable Polymers
Temporary Lift-off Resists
Semiconductor Technologies
Other
Positive Photoresists
Negative Photoresists
E-beam Resists
Nanoimprint Lithography Resists
Hybria Polymers
UV™ 210GS Positive DUV Photoresist
Multipurpose resist that can be utilized for gate, phase shift mask contact holes, and trench applications in the 180-130 nm CD range
· Compatible with a wide range of substrates including silicon and both organic and inorganic anti-reflective materials
· 150°C thermal stability
Ancillaries:
· CD-26 Developer
· Remover 1165
· EBR-10A Edge Bead Remover
Applications:
· General Lithography: Positive DUV Resists
MODEL
UV210GS
上海甫晟微半导体有限公司
上海 奉贤 平庄西路1599号，201400
Tel: 021- 4001274753
Fax: 13776005180(Wechat)
E-mail: 13776005180@163.com
www.fushengwei.com
For more information, please visit our website:
https://www.fushengwei.com
The copyright belongs to our company and cannot be copied, copied or used in any other way without permission. Otherwise, our company will have the right to pursue legal responsibility.
© 2023 上海甫晟微半导体有限公司 版权所有 沪ICP备2023014501号-1 技术支持：迅响科技