PHOTORESISTS & SPECIALTY CHEMICALS
Permanent Photo-patternable Epoxies
Permanent Photo-patternable Polymers
Temporary Lift-off Resists
Semiconductor Technologies
Other
Positive Photoresists
Negative Photoresists
E-beam Resists
Nanoimprint Lithography Resists
Hybria Polymers
UV™6 Positive DUV Resist
Optimized to provide vertical profile imaging of dense and semi-isolated features for device production design rules to 180 nm
· Superior etch resistance
· Wide process window
· 150° thermal stability
Ancillaries:
· CD-26 Developer
· Remover 1165
· EBR-10A Edge Bead Remover
Applications:
· General Lithography: Positive DUV Resists
MODEL
UV6-0.6
UV6-0.7
UV6-0.8
上海甫晟微半导体有限公司
上海 奉贤 平庄西路1599号，201400
Tel: 021- 4001274753
Fax: 13776005180(Wechat)
E-mail: 13776005180@163.com
www.fushengwei.com
For more information, please visit our website:
https://www.fushengwei.com
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